Keywords: Ceramic Tile PVD Coating Machine
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Product Description
Feature
1)Horizontal and vertical structure;
2)Single side or double sides coating at the same time, high production efficiency;
3)DC magnetron sputtering cathode can be selected based on request;
4)Vacuum system consists of mechanical pump, roots pump and diffusion pump.
Main Technical Parameters
Film Type | EMI Film |
Power Type | DC Magnetron Sputtering Power Supply+High Voltage Ion Bombard Power Supply |
Cylinder Target | DC Magnetron Sputtering Target(Oxygen-Free Copper, Stainless Steel) |
Vacuum Chamber Structure | Vertical Double Open Doors Or Horizontal Side Open Door |
Vacuum System | Mechanical Pump+Roots Pump+Diffusion Pump(Option: Turbo Pump, Polycold) |
Control System | Full Automatic With Touch Screen |
Chamber Inner Size | According to Customer’s Specific Request |
EMI Vacuum Coating Machine
EMI Electronic Products
Commercial Condition
1)Trade Terms: EXW, FOB, CIF
2)Payment Terms: TT, LC
3)Lead Time: 70 Working Days
JXS Service
1)Whole Vacuum Coating Plant Turnkey Project
2)14 Days Free Installation And Training
3)Custom Made Vacuum Coating Machine Solution
4)Vacuum Coating Machine Spare Parts & Consumables Providing
5)Life Time Technical Support